Synchrotron radiated X-rays, including EUV
(~100eV) and soft X-ray (1~2 KeV), are used in NSRRC to pattern/fabricate
nano/micro structure for semiconductor, MEMS or NEMS applications.
X-ray Fabrication
X-ray Fabrication (or “LIGA” technique) is a
nano/micro fabrication technology including lithography, electroforming and
micro molding. High intensity and highly collimated SR X-rays is used to
provide high resolution and high aspect ratio lithographic capability. LIGA
technique has been widely used fabricating micro optics, micro mechanic and
microwave applications. (more
information!)
EUV Lithography
EUV Lithography (6.7~13.5 nm) is one of the main streams for the next generation lithography (NGL) semiconductor technology with a resolution down to 22nm and beyond.
A national EUVL project for nano technology is carried out at NSRRC (2008.8~2013.7). Using the SR EUV light source, several end stations for researches of resist out gassing,
radiation damage, nkt measurement and Interferometry lithography, has been established to meet the requirements from the industry.