Photoelectron Emission Microscopy is an imaging technique that utilizes
secondary electron emitted from surface upon x-ray irradiation to form a frame
of image. High resolution surface and sub-surface image with elemental,
chemical and magnetic contrast can be acquired.
Major instrumentation
Experimental technique
Capabilities
- Energy Rang: 60 ~ 1400eV
- Polarization: Linear, left/right circular, elliptical polarized Spatial Resolution (UV/SR source): Better than 0.15/0.2μm
- Sample Requirement: Solid, UHV compatible, 5~10mm in diameter
Useful Information
Schematic drawing of PEEM Station
Omicron FOCUS-IS PEEM Optics
PEEM Station at EPU
AUV image of NiFe ring with 0.5µm Line Width