學歷:
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- 美國賓州州立大學工程科學與機械博士(1997-2003)
- 國立清華大學物理碩士(1995~1997)
- 國立清華大學物理學士(1988~1992)
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經歷:
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- 國家同步輻射研究中心助研究員(2006~)
- 國家同步輻射研究中心專案副研究員(2004~2005)
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研究領域:
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- 電負性電漿量測
- 介電質微波特性量測
- 電磁模擬
- 真空薄膜濺鍍與蒸鍍
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代表作:
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- H. -P. Hsueh, C. -K. Kuan, T. -S. Ueng, G. -Y. Hsiung, and J. -R. Chen, “Numerical Simulation and Mechanical Design for TPS Electron Beam Position Monitors”, Synchrotron Radiation Instrumentation: Ninth International Conference on Synchrotron Radiation Instrumentation, AIP Conference Proceedings -- 879, 2007.
- G. -Y. Hsiung, C. -K. Chan, H. -P. Hsueh, T. -L. Yang, C. -K. Kuan, C. -C. Chang, S. -N. Hsu, C. -Y. Yang, C. -L. Chen, and J. -R. Chen, “Design of the Aluminum Vacuum Chambers for the 3 GeV TPS Electron Storage Ring”, Synchrotron Radiation Instrumentation: Ninth International Conference on Synchrotron Radiation Instrumentation, AIP Conference Proceedings -- 879, 2007..
- G. -Y. Hsiung, C. -K. Chan, H. -P. Hsueh, T. -L. Yang, C. -C. Chang, S. -N. Hsu, C. -Y. Yang, C. -L. Chen, and J. -R. Chen, “Performance of the TLS Vacuum Systems Operated at 300 mA of Top-up Mode”, Synchrotron Radiation Instrumentation: Ninth International Conference on Synchrotron Radiation Instrumentation, AIP Conference Proceedings -- 879, 2007..
- H. -P. Hsueh, C. -K. Kuan, T. -S. Ueng, G. -Y. Hsiung, C. -H. Chang, and J. -R. Chen, “Optimization for Taiwan Photon Source Electron Beam Position Monitors through Numerical Simulation”, Proceedings of EPAC2006, p.3436, June 26~30, Edinburgh, UK (2006)..
- G.-Y. Hsiung, C.-K. Chan, C.-H. Chang, H.-P. Hseuh, T.-L. Yang, and J.-R. Chen, “Design Concept of the Vacuum System for the 3 GeV Taiwan Photon Source”, Proceedings of EPAC2006, p.3433, June 26~30, Edinburgh, UK (2006)..
- H. -P. Hsueh, R. T. McGrath, B. Ji, B. S. Felker, J. G. Langan, and E. J. Karwacki, “Ion energy distributions and optical emission spectra in NF3-based process chamber cleaning plasmas”, Journal of Vacuum Science & Technology B 19(4), 2001..
- H. -P. Hsueh,, B. S. Felker, R. T. McGrath, and J. G. Langan, “Ion energy distribution in NF3 based process chamber cleaning discharges”, Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on, 1999..
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