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Name：
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許博淵( Bor-Yuan Shew )
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EXT.：
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7316
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E-mail：
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yuan@nsrrc.org.tw
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Education：
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- Ph. D. in Material Science and Engineering, Cheng-Kung University, Taiwan, 1996.
- M.S. in Material Science and Engineering, Cheng-Kung University, Taiwan, 1991.
- B. E. in Mechanical Engineering, Cheng-Kung University, Taiwan, 1989.
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Experience：
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- Research Scientist, NSRRC (2026~)
- Head of Industry Applications Division (2021-2023)
- Group Leader, Industrial Application Group, Experimental Facility Division, NSRRC (2011-2020)
- Associate Research Scientist, NSRRC (2004-2025)
- Group Leader, Device Technology Group, Research Division, NSRRC (2003-2008)
- Assistant Research Scientist, NSRRC (2000-2003)
- Visiting Scientist, Institute for Microsystems Technology (IFMT), TU Berlin, Germany (1997, 1998)
- Post doctor, NSRRC, Industrial application group (1996-2000)
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Endstation：
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- 18B2 Micromachining, 19A1 X-ray lithography, Micro/Nano fabrication FAB
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Research Interests：
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- LIGA technology
- Micro/Nano fabrication
- Optical microsystem
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Selected Publications：
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- [Technique Transfer] Bor-Yuan Shew*, High-Precision and High-Efficient Deep X-ray Lithography Technology, 2017 (Contract Number: 2017D-技術授權)
- [Patent] Bor-Yuan Shew*, X-ray mask structure and method for preparing the same, US Patent 9,152,036 B2, 2015. This invention has been granted patents in Germany (602013078614.3), France (EP2851749), Japan (特許第5792848號), Korea (10-1578996) and Taiwan (第I 498669號).
- Ching-Yu Chiang, Hui-Chia Su,* Pin-Jiun Wu, Heng-Jui Liu, Chih-Wei Hu, Neeraj Sharma, Vanessa K. Peterson, Han-Wei Hsieh, Yu-Fang Lin, Wu-Ching Chou, Chih-Hao Lee, Jyh-Fu Lee, and
Bor-Yuan Shew*, Vanadium Substitution of LiFePO4 Cathode Materials To Enhance the Capacity of LiFePO4‑Based Lithium-Ion Batteries, J. Phys. Chem. C, 116(2012) 24424−24429
- B.Y. Shew*, Y.C. Cheng, Y.H. Tsai, “Monolithic SU-8 micro-interferometer for biochemical detections”, Sens. Actuators A: Phys. 141(2) 299-306 (2008)
- C. H. Ko*, B. Y. Shew*, M. C. Liang, S. C. Hsu, C. C. Lui and C. K. Lo, “Micrograting fabricated by deep x-ray lithography for optical communications”, Optical Engineering, 46(4), 048001, (2007)
- B. Y. Shew*, H. C. Li, C. H. Ko, C. L. Pan, “X-ray micromachining SU-8 resist for a THz photonic filter”, J. Phys. D: Appl. Phys., 38 (2005) 1097-1103
- B. Y. Shew*, J. T. Hung, T. Y. Huang, K. P. Liu, Chang-Pin Chou, “High Resolution X-ray Micromachining Using SU-8 Resist”, J. Micromech. Microeng., 13(5), 708-713, 2003.
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