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Name：
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許博淵( Bor-Yuan Shew )
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EXT.：
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7316
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E-mail：
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yuan@nsrrc.org.tw
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Education：
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- Ph. D. in Material Science and Engineering, Cheng-Kung University, Taiwan, 1996.
- M.S. in Material Science and Engineering, Cheng-Kung University, Taiwan, 1991.
- B. E. in Mechanical Engineering, Cheng-Kung University, Taiwan, 1989.
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Experience：
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- Associate Research Scientist, NSRRC, (2004-)
- Group Leader, Device Technology Group, Research Division, NSRRC, (2003-2008)
- Assistant Research Scientist, NSRRC, (2000-2003)
- Visiting Scientist, Institute for Microsystems Technology (IFMT), TU Berlin, Germany, (1997, 1998)
- Post doctor, NSRRC, Industrial application group, (1996-2000)
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Endstation：
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- 18B2 Micromachining, 19A1 X-ray lithography, Micro/Nano fabrication FAB
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Research Interests：
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- LIGA technology
- Micro/Nano fabrication
- Bio and optical microsystem
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Selected Publications：
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- B.Y. Shew, Y.C. Cheng, Y.H. Tsai, “Monolithic SU-8 micro-interferometer for biochemical detections”, Sens. Actuators A: Phys. 141(2) 299-306 (2008)
- K. D. Vora, B-Y. Shew, E. C. Harvey, J. P. Hayes, A. G. Peele, “Sidewall slopes of SU-8 HARMST using deep x-ray lithography”, J. Micromech. Microeng., 18 (2008) 035037
- C. H. Ko*, B. Y. Shew*, M. C. Liang, S. C. Hsu, C. C. Lui and C. K. Lo, “Design, fabrication and measurement of a concave-micro-grating spectrometer chip fabricated by x-ray lithographic technology for applications in optical telecommunications”, Optical Engineering, 46(4), 048001, (2007)
- B. Y. Shew, C. S. Kuo, Y. H. Tsai, Y. C. Zung, “UV-LIGA Polymeric Bio/Chemical Sensor Based on Optical Waveguide Interferometer”, Sensors & Actuators A, 120(2005), 383-389
- Bor-Yuan Shew, H. C. Li, C. H. Ko, C. L. Pan, “X-ray micromachining SU-8 resist for a THz photonic filter”, J. Phys. D: Appl. Phys., 38 (2005) 1097-1103
- B. Y. Shew, T. Y. Huang, K. P. Liu, “Oxygen Quenching in Ultra-Deep X-ray Lithography with SU-8 Resist”, J. Micromech. Microeng. 14 (3), 410 - 414, 2004 (SCI, EI).
- B. Y. Shew, J. T. Hung, T. Y. Huang, K. P. Liu, Chang-Pin Chou, “High Resolution X-ray Micromachining Using SU-8 Resist”, J. Micromech. Microeng., 13(5), 708-713, 2003. (SCI, EI)
- Y. Cheng, B. Y. Shew, C. Y. Lin, D. H. Wei and M. K. Chyu, “Ultra-deep LIGA process”, J. Micromech. Microeng. 9, 58-63, March 1999. (SCI, EI)
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